![Effects of Sputtering Power, Working Pressure, and Electric Bias on the Deposition Behavior of Ag Films during DC Magnetron Sputtering Considering the Generation of Charged Flux | SpringerLink Effects of Sputtering Power, Working Pressure, and Electric Bias on the Deposition Behavior of Ag Films during DC Magnetron Sputtering Considering the Generation of Charged Flux | SpringerLink](https://media.springernature.com/lw685/springer-static/image/art%3A10.1007%2Fs13391-021-00314-8/MediaObjects/13391_2021_314_Fig1_HTML.png)
Effects of Sputtering Power, Working Pressure, and Electric Bias on the Deposition Behavior of Ag Films during DC Magnetron Sputtering Considering the Generation of Charged Flux | SpringerLink
![Schematic Diagram of DC magnetron sputtering system with Langmuir probe. | Download Scientific Diagram Schematic Diagram of DC magnetron sputtering system with Langmuir probe. | Download Scientific Diagram](https://www.researchgate.net/publication/258642791/figure/fig5/AS:668854124552200@1536478658813/Schematic-Diagram-of-DC-magnetron-sputtering-system-with-Langmuir-probe.png)
Schematic Diagram of DC magnetron sputtering system with Langmuir probe. | Download Scientific Diagram
![PDF] Residual stress control of Cu film deposited using a pulsed direct current magnetron sputtering | Semantic Scholar PDF] Residual stress control of Cu film deposited using a pulsed direct current magnetron sputtering | Semantic Scholar](https://d3i71xaburhd42.cloudfront.net/e772d3be05e680e8623ad6d1e08d859bccac571e/2-Figure1-1.png)
PDF] Residual stress control of Cu film deposited using a pulsed direct current magnetron sputtering | Semantic Scholar
![Coatings | Free Full-Text | The Effect of Charged Ag Nanoparticles on Thin Film Growth during DC Magnetron Sputtering Coatings | Free Full-Text | The Effect of Charged Ag Nanoparticles on Thin Film Growth during DC Magnetron Sputtering](https://www.mdpi.com/coatings/coatings-10-00736/article_deploy/html/images/coatings-10-00736-g001.png)
Coatings | Free Full-Text | The Effect of Charged Ag Nanoparticles on Thin Film Growth during DC Magnetron Sputtering
![Improvement of Metallic Thin Films for HR-SEM by Using DC Magnetron Sputter Coater | Science Lab | Leica Microsystems Improvement of Metallic Thin Films for HR-SEM by Using DC Magnetron Sputter Coater | Science Lab | Leica Microsystems](https://www.leica-microsystems.com/fileadmin/academy/user_upload/Fig1.jpg)
Improvement of Metallic Thin Films for HR-SEM by Using DC Magnetron Sputter Coater | Science Lab | Leica Microsystems
![Kurt J. Lesker Company | A Positive Kick Enhances the High Power Impulse Magnetron Sputter Process | Enabling Technology for a Better World Kurt J. Lesker Company | A Positive Kick Enhances the High Power Impulse Magnetron Sputter Process | Enabling Technology for a Better World](https://www.lesker.com/newweb/images/blogImages/photo-blog-positive-kick-Fig-01.jpg)
Kurt J. Lesker Company | A Positive Kick Enhances the High Power Impulse Magnetron Sputter Process | Enabling Technology for a Better World
![Coatings | Free Full-Text | Recent Developments in R.F. Magnetron Sputtered Thin Films for pH Sensing Applications—An Overview Coatings | Free Full-Text | Recent Developments in R.F. Magnetron Sputtered Thin Films for pH Sensing Applications—An Overview](https://www.mdpi.com/coatings/coatings-04-00756/article_deploy/html/images/coatings-04-00756-g001.png)
Coatings | Free Full-Text | Recent Developments in R.F. Magnetron Sputtered Thin Films for pH Sensing Applications—An Overview
![A comparative study of direct current magnetron sputtering and high power impulse magnetron sputtering processes for CNx thin film growth with different inert gases - ScienceDirect A comparative study of direct current magnetron sputtering and high power impulse magnetron sputtering processes for CNx thin film growth with different inert gases - ScienceDirect](https://ars.els-cdn.com/content/image/1-s2.0-S0925963516300097-fx1.jpg)